Annelies Delabie is a principal member of the technical staff at imec, research institute for nano-electronics and digital technologies, and a professor in the department of chemistry at the university of Leuven (KU Leuven), both in Leuven, Belgium. She received a PhD degree in science from the university of Leuven in 2001 and joined imec the same year. Her research focusses on the fundamentals and applications of thin films and thin film deposition techniques, with a focus on atomic layer deposition, chemical vapor deposition, surface functionalization and area-selective deposition. She is a member of the committee of the American vacuum society international conference on atomic layer deposition since 2006, and she co-chaired the conference in Brugges in 2008. She is also a program committee member of the area-selective deposition workshop, and she chaired the workshop in Leuven in 2016. She is (co-)author of 10 patents and more than 230 scientific publications.