We welcome you to the joint conference on Low Energy Electron Applications in Patterning (LE2AP) + Low Energy Electron Lithography, Imaging and Soft Matter (LEELIS) to be held on 9th-11th September 2024 at imec (Leuven, Belgium). LE2AP+LEELIS is an initiative that aims to merge the communities of researches from initial Training Networks ELENA (https://elena.hi.is/) and SIMDALEE2 (https://cordis.europa.eu/ project/id/606988), both Marie Sklodowska - Curie EU-funded initiatives, and from the LEELIS conference series (held bi-yearly since 2015).


Fundamental research on the generation of low energy electrons and their interaction with molecules and thin films towards applications for patterning and imaging.

Specifically, the generation of low energy electrons induced in matter by electron beam, photon beam, ion beam or atom beam, the absorption/transmission through matter, the electron mean free path, the sample/photoresists/stack interactions and charging and damage mechanisms, related characterization techniques (photoemission, total electron yield, residual gas analysis, tomography, mass spectrometry, electron / infrared spectroscopy.

Patterning and imaging of materials both at small scale and at high volume manufacturing: focused e-beam induced processing (FEBIP), electron beam lithography (EBL), extreme ultraviolet lithography (EUVL), ion/atom beam lithography, X-ray lithography, low-energy electron microscopy (LEEM), low-voltage (scanning) electron microscopy.

Important dates



9 - 11 September 2024

Call for papers opens

11 March 2024

Deadline for abstract submission

07 June 2024

Acceptance notification

21 June 2024

Registration opens

15 May 2024

Final program online

12 July 2024

Early bird registration ends

31 July 2024

Posters only accepted until

08 July 2024


100+ participants from Asia, Europe and the Americas

Mix of industry and academic professionals

+/- 50 presentations and posters

1 poster session

1 social event

 Best paper award

 Industrial exhibition and pitch