Conference program
Conference program
Hello,
Nice to have you on this page to see what we will talk about during the conference. The program is ready, however come back here regularly and check out for eventual updates.
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Confirmed keynote and invited speakers
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Monday 9 Sep.
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Poster session
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Tuesday 10 Sep.
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Wednesday 11 Sep.
ASML, The Netherlands |
EUV Lithography, status and prospects (keynote) |
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TU Wien, Institute of Applied Physics, Austria |
Energy Dissipation of Fast Electrons in Polymethyl methacrylate (PMMA): |
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Hanyang University, South Korea |
Hybrid Multilayer EUV Dry Resist for 1.5 nm Technology Node |
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University of Tokyo, Japan |
Laser-based photoemission electron microscopy for the semiconductor industry |
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INPRIA Corp., United States |
Everything industry always wanted to know about LEES (*but was too hard to measure) |
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TU Wien, Institute of Photonics, Austria |
Low-Energy Electrons near Surfaces: Mechanisms and Dynamics |
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University of Sheffield, Department of Materials Science and Engineering, United Kingdom |
SEE MORE: Secondary Electron Emission - Mapping Order & chemical Reactions/bonding |
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Bremen University, Institute for Applied and Physical Chemistry, |
Beyond the design of FEBID precursors. Exploring the chemistry of process gases and thermal surface reactions. (keynote) |
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University of York, School of Physics, Engineering and Technology, United Kingdom |
Low energy electron generation through metastable helium de-excitation at solid surfaces |
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University of Rennes, Institute of Physics, France |
What is the influence of the band structure on the dielectric function |
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Institute of Matter Structure, CNR (Rome), Italy |
Low energy electrons on biomolecules, challenges and opportunities |
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NOVA School of science and technology, Universidade NOVA de Lisboa |
Low energy interactions with perfluorophenyl trifluoromethanesulfonate EUVL photoresist material |
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Monday 9 September
08:00 - 09:00
Badge pickup and coffee
imec 1 hall
09:00 - 09:15
LE2AP+LEELIS conference welcoming and opening remarks
imec 1 auditorium
09:15 - 10:00
Jos Benschop, ASML, the Netherlands
EUV Lithography, status and prospects - keynote
10:00 - 10:30
Sonia Castellanos Ortega, INPRIA Corp., USA
Everything industry always wanted to know about LEES (*but was too hard to measure) - invited
10:30 - 11:00
Coffee break
imec 1 hall
11:00 - 11:20
Sascha Brose, RWTH Aachen University, Germany
Design and realization of an in-lab EUV dual beamline for industrial and scientific applications
11:20 - 11:50
Wolfgang Werner, TU Wien, Austria
Energy dissipation of fast electrons in PMMA - invited
11:50 - 12:10
Lois Fernández Míguez, TU Eindhoven, the Netherlands
Molecular-scale kinetic Monte Carlo simulation model of pattern formation in EUV photoresists
12:10 - 13:30
Lunch
imec 1 hall
13:30 - 14:00
Andrew Pratt, University of York, UK
Low energy electron generation through metastable helium de-excitation at solid surfaces - invited
14:00 - 14:20
Sylvie Rangan, Rutgers University, USA
Secondary electron yields, electronic structure, and chemical environment of surfaces
14:20 - 14:50
Alessandra Bellissimo, TU Wien, Austria
Low-energy electrons near surfaces: mechanisms and dynamics - invited
14:50 - 15:10
Alice Apponi, Università Roma Tre and INFN, Italy
Transmission through graphene of electrons in the 30 - 900 eV range
15:10 - 15:40
Coffee break
imec 1 hall
15:40 - 16:10
Cornelia Rodenburg, University of Sheffield, UK (pres. A. Pratt)
SEE MORE: Secondary Electron Emission - Mapping Order & chemical Reactions/bonding - invited
16:10 - 16:30
Maarten van Es , TNO, the Netherlands
Spatially resolved chemical metrology on EUV resist
16:30 - 19:00
Poster session
Tent outside imec 2
Georghii Tchoudinov
Metal Oxide Photoresist electronic spectroscopic quantities and Low Electron Energy Charge Density generation
University of Camerino and IOM-CNR, Italy
Gayoung Kim
Fluorinated Organic Compounds as Candidates for EUV Lithographic Patterning
Inha University, South Korea
Li-Ting Tseng
Development of negative tone resist towards high sensitivity
PiBond Oy, Finland
Elchin Huseynov
Evaluating radiation effects on the nanocrystalline TiC particles Using FTIR spectroscopy
Institute of Radiation Problems, Azerbaijan
Mohammad Saifullah
Decoding Mechanistic Aspects of Resist Exposure in Electron Beam & Extreme Ultraviolet Lithography
PiBond Oy, Finland
Fabian Holzmeier
Dissociative Photoionization of EUV Lithography Photoresist Proxies
imec, Belgium
Vasil Yordanov
A semiclassical kinematic photoemission model for secondary electrons in solids
imec, Belgium and Purdue University, USA
Hanna Boeckers
Electron-induced deposition using Fe(CO)4MA and Fe(CO)5 – Effect of MA ligand and process conditions
University of Bremen, Germany
Cameron Cochrane
Exploring the Reactivity of Novel Resist Materials for Metastable Helium Atom Beam Lithography
University of Birmingham, UK
Shikhar Arvind
Investigating Plasma Interaction with Ultrathin photoresists for EUV Lithography
imec, Belgium
Gayoung Kim
Approach for Improving Sensitivity of Fluorinated Extreme UV Resist with Electron-rich Vinyl Groups
Inha University, South Korea
Sirorat Toocharoen
Effect of Electron Beam Irradiation on Polyethylene: Controlling Craze Formation
Shibaura Institute of technology, Japan
Lise Estournet
Experimental assessment of photoresist damage during electron beam exposure
TU Delft, the Netherlands
Yejin Ku
Facile Identification Method of an Effective Highly-Absorbing Element for Extreme UV Lithography
Inha University, South Korea
Jin-Kyun Lee
A Candidate for Positive-tone Metal Oxide EUV Resist
Inha University, South Korea
Felix Blödorn
Energy dissipation of low-energy electrons in PMMA investigated with electron coincidence spectroscopy (SE2ELCS)
TU Wien, Austria
Oddur Ingólfsson
Low energy electron induced fragmentation of 2-(trifluoromethyl) acrylic acid in the gas phase under single collision conditions
University of Iceland, Iceland
Oddur Ingólfsson
Low energy electron induced gas phase fragmentation of CF3AuCNC(CH3)3 under single collision conditions and at elevated pressure
University of Iceland, Iceland
Pedro Guerra
Electron-induced chemistry in EUVL photoresist materials: study on perfluorophenyl trifluoromethanesulfonate
Universidade NOVA de Lisboa, Portugal
Simon Gillard
Investigation of energy dissipation and electron beam attenuation of LEEs in DNA
TU Wien, Austria
Cheng Wang
Time-dependent characterization of total electron yield and outgassing in model EUV resist materials
Lawrence Berkeley National Lab, USA
Faegheh Sajjadian
Isolating the role of photoionization in extreme ultraviolet exposure of co-polymers present in chemically amplified photoresists by gas phase electron-ion coincidence experiments
imec, Belgium
Veronika Stara
Electron-Induced Phase Transition of Organic Semiconductors in LEEM
CEITEC, Czech Republic
Tuesday, September 10, 2024
08:00 - 09:00
Badge pickup and coffee
09:00 - 09:15
LE2AP+LEELIS conference welcoming and opening remarks
09:15 - 09:45
Myung Mo Sung, Hanyang University, Republic of Korea
Hybrid multilayer EUV dry resist for 1.5 nm technology node - invited
09:45 - 10:05
Kevin Dorney, imec, Belgium
Mechanistic insights of exposure and process chemistry of metal oxide photoresist materials
10:05 - 10:25
Jin-Kyun Lee, Inha University, Republic of Korea
EUV resists exploiting the Lewis acid-lewis base interaction chemistry
10:25 - 10:55
Coffee break
imec 1 hall
10:55 - 11:15
Bilal Navqi, KU Leuven and imec, Belgium
Finding the sensitivity and resolution tradeoff in EUV resist (PReRAC) by comparing radical and acid amplified cross-linking
11:15 - 11:35
Yejin Ku, Inha University, Republic of Korea
Resist-underlayer bilayer stack system for improving patterning performance
11:35 - 11:55
Howard Fairbrother, Johns Hopkins University, USA
Zinc-imidazolate films as an all-dry resist technology
11:55 - 13:15
Lunch
imec 1 hall
13:15 - 13:45
Toshiyuki Taniuchi, University of Tokyo, Japan
Laser-based photoemission electron microscopy for the semiconductor industry - invited
13:45 - 14:05
Timon Fliervoet, ASML and TU Delft, the Netherlands
System State: standardization of image-based diagnostics and verification for low voltage e-beam inspection and metrology tools
14:05 - 14:25
Takeyoshi Ohashi, Hitachi, Ltd., Japan
Novel low energy electron beam techniques for semiconductor manufacturing
14:25 - 14:45
John Xanthakis, National Technical University of Athens, Greece
A self-consistent Schroedinger - Laplace calculation of electron emission from nanometric curvature surfaces
14:45 - 15:15
Coffee break
imec 1 hall
15:15 - 15:45
Paola Bolognesi, Institute of Matter Structure, CNR, Italy
Low energy electrons on biomolecules, challenges and opportunities - invited
15:45 - 16:05
Juraj Fedor, Czech Academy of Sciences, Czech Republic
Electron-induced processes in liquid microjets: spectroscopy and reactivity
16:05 - 16:15
Closing remarks 2nd day
imec 1 auditorium
18:00 - 19:00
Welcome and reception at Leuven City Hall
19:00 - 19:30
Walking to social dinner event
19:30 - 23:00
Social event dinner at De Hoorn
Wednesday, September 11, 2024
07:30 - 08:30
Badge pickup and coffee
imec 1 hall
08:30 - 08:45
LE2AP+LEELIS conference welcoming and opening remarks
imec 1 auditorium
08:45 - 09:30
Petra Swiderek, Bremen University, Germany
Beyond the design of FEBID precursors. Exploring the chemistry of process gases and thermal surface reactions - keynote
09:30 - 10:30
Industrial pitch, All sponsors
5 minutes each
10:30 - 11:00
Coffee break
imec 1 hall
11:00 - 11:30
Filipe Ferreira da Silva, Universidade NOVA de Lisboa, Portugal
Low energy interactions with perfluorophenyl trifluoromethanesulfonate EUVL photoresist - invited
11:30 - 11:50
Toru Fujimori, FUJIFILM Corporation, Japan
EUV CAR-NTD with new developer for stochastic reduction
11:50 - 12:10
Carmen Popescu, Irresistible Materials, UK
Multi Trigger Resist for high-NA
12:10 - 12:40
Didier Sébilleau, University of Rennes, France
What is the influence of the band structure on the dielectric function? - invited
12:40 - 13:00
Best Paper Award
LE2AP+LEELIS closing remarks and adjourn
imec 1 auditorium
13:00 - 14:00
Lunchbox and end of the conference
imec 1 hall
14:00 - 15:00
Optional visit of imec 300mm cleanroom (window tour) - registration onsite at the conference reception desk required (only for conference participants)