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About LE2AP+LEELIS
We welcome you to the joint conference on Low Energy Electron Applications in Patterning (LE2AP) + Low Energy Electron Lithography, Imaging and Soft Matter (LEELIS) to be held on 9-11 September 2024 at imec (Leuven, Belgium). LE2AP+LEELIS is an initiative that aims to merge the communities of researchers from Initial Training Networks ELENA (https://elena.hi.is/) and SIMDALEE2 (https://cordis.europa.eu/ project/id/606988), both Marie Skłodowska-Curie EU-funded initiatives, and from the LEELIS conference series (held bi-yearly since 2015).
The conference chair is Danilo De Simone (imec) and the scientific committee includes Annalies Delabie (KU Leuven and imec), Bodil Holst (University of Bergen), Oddur Ingólfsson (University of Iceland), Kees Hagen (TU Delft), Jacob Hoogenboom (TU Delft), Giovanni Stefani (CNR-ISM), and Roberto Fallica (imec).
The local organization committee includes Sandy Vergult-Miller, Fred Loosen and Roberto Fallica (imec).
Conference topics
The subject of the conference is the fundamental research on the generation of low energy electrons and their interaction with molecules and thin films towards applications for patterning and imaging. Specifically, the generation of low energy electrons induced in matter by electron beam, photon beam, ion beam or atom beam, the absorption/transmission through matter, the electron mean free path, the sample/photoresists/stack interactions and charging and damage mechanisms, related characterization techniques (photoemission, total electron yield, residual gas analysis, tomography, mass spectrometry, electron / infrared spectroscopy.
The conference will cover the patterning and the imaging of materials both at small scale and at high volume manufacturing:
* focused e-beam induced processing (FEBIP)
* electron beam lithography (EBL)
* extreme ultraviolet lithography (EUVL)
* ion/atom beam lithography
* X-ray lithography
* low-energy electron microscopy (LEEM)
* low-voltage (scanning) electron microscopy (SEM)
* photon / electron sensitive materials
Goals of the meeting
* Advancing the understanding of low-energy electron related phenomena by gathering experts of all relevant disciplines.
* Recognizing future applications both at the lab scale and industrial level.
* Addressing the fundamental needs for implementation in patterning via synergy between academia and semiconductor industry.
* Creating new opportunities and attracting early-stage researchers to pursue their career in the field.
* Stimulating collaboration among researchers and engineers to enable future patterning applications.
Scientific significance
It has been long known that low energy electrons have a key role in the reaction during patterning and cause damage in high-resolution microscopy, but research in this field has been scattered due to the great variety of research fields, including electron beam lithography, low-voltage electron microscopy, ion beam and extreme ultraviolet lithography. Such lack of understanding has led to difficulties in imaging and patterning soft, organic materials at the highest resolution and designing next-generation photo- and electron-sensitive materials to advance performance (i.e., resolution, sensitivity). Moreover, few scientific events and meetings are dedicated to the topic of low energy electrons in patterning and imaging applications. This conference aims at bridging this gap and gathering researchers in various disciplines to develop a broader understanding and push frontiers in imaging and nanofabrication.